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This book focuses on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. It discusses the obstacles any new technology must overcome to be commercially successful with specific references to the challenges confronting Silicon-Molecular Beam Epitaxy.
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation., whilst Volume II treats all aspects of heteroepitaxy.
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