Books in the Springer Series in Surface Sciences series

This significantly extended second edition addresses the important physical phenomenon of Surface Plasmon Resonance (SPR) or Surface Plasmon Polaritons (SPP) in thin metal films, a phenomenon which is exploited in the design of a large variety of physico-chemical optical sensors.

This book presents developments of techniques for detection and analysis of two electrons resulting from the interaction of a single incident electron with a solid surface.

As well as coverage of the base concepts in thin film theory, this volume has details of many of the latest results in the field, including materials mixtures and nanostructured coatings. It includes dedicated software packages for materials characterization.

Micro-X-ray fluorescence offers the possibility for a position- sensitive and non-destructive analysis that can be used for the analysis of non-homogeneous materials and layer systems.

This comprehensive work on pulsed laser ablation explicitly links the principles and methodology to the physical properties of the irradiated materials. From the basics to the most advanced topics, it incorporates the latest theory and experimental data.

This book presents the basics of Auger- and X-Ray Photoelectron Spectroscopy in Materials Science in logical order from sample preparation and instrument setup through data acquisition to data evaluation. Offers guidance on problem-solving and worked examples.

This is the first ever comprehensive treatment of NEXAFS spectroscopy. It is suitable for novice researchers as an introduction to the field, while experts will welcome the detailed description of state-of-the-art instrumentation and analysis techniques, along with the latest experimental and theoretical results.

Scanning tunnelling microscopy (STM) is a powerful technique for surface analysis with atomic resolution. The book appeals to researchers, advanced students and analysts in industrial laboratories.

This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces.

This book provides a comprehensive introduction to the methods and variety of Kelvin probe force microscopy, including technical details. It also offers an overview of the recent developments and numerous applications, ranging from semiconductor materials, nanostructures and devices to sub-molecular and atomic scale electrostatics.In the last 25 years, Kelvin probe force microscopy has developed from a specialized technique applied by a few scanning probe microscopy experts into a tool used by numerous research and development groups around the globe. This sequel to the editors' previous volume "Kelvin Probe Force Microscopy: Measuring and Compensating Electrostatic Forces," presents new and complementary topics.It is intended for a broad readership, from undergraduate students to lab technicians and scanning probe microscopy experts who are new to the field.

This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics.

This monograph discusses the essential principles of the evaporationprocess by looking at it at the molecular and atomic level.In the first part methods of statistical physics, physical kinetics andnumerical modeling are outlined including the Maxwell's distributionfunction, the Boltzmann kinetic equation, the Vlasov approach, and theCUDA technique.The distribution functions of evaporating particles are then defined.Experimental results on the evaporation coefficient and the temperaturejump on the evaporation surface are critically reviewed and compared tothe theory and numerical results presented in previous chapters.The book ends with a chapter devoted to evaporation in differentprocesses, such as boiling and cavitation.This monograph addressesgraduate students and researchers working on phase transitions andrelated fields.

This second edition provides a cutting-edge overview of physical, technical and scientific aspects related to the widely used analytical method of confocal Raman microscopy.

This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed.

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.

This monograph discusses the essential principles of the evaporationprocess by looking at it at the molecular and atomic level.In the first part methods of statistical physics, physical kinetics andnumerical modeling are outlined including the Maxwell's distributionfunction, the Boltzmann kinetic equation, the Vlasov approach, and theCUDA technique.The distribution functions of evaporating particles are then defined.Experimental results on the evaporation coefficient and the temperaturejump on the evaporation surface are critically reviewed and compared tothe theory and numerical results presented in previous chapters.The book ends with a chapter devoted to evaporation in differentprocesses, such as boiling and cavitation.This monograph addressesgraduate students and researchers working on phase transitions andrelated fields.

This book provides a comprehensive introduction to the methods and variety of Kelvin probe force microscopy, including technical details. It also offers an overview of the recent developments and numerous applications, ranging from semiconductor materials, nanostructures and devices to sub-molecular and atomic scale electrostatics.In the last 25 years, Kelvin probe force microscopy has developed from a specialized technique applied by a few scanning probe microscopy experts into a tool used by numerous research and development groups around the globe. This sequel to the editors¿ previous volume ¿Kelvin Probe Force Microscopy: Measuring and Compensating Electrostatic Forces,¿ presents new and complementary topics.It is intended for a broad readership, from undergraduate students to lab technicians and scanning probe microscopy experts who are new to the field.

This second edition provides a cutting-edge overview of physical, technical and scientific aspects related to the widely used analytical method of confocal Raman microscopy.

This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics.

Experimental advances in helium atom scattering spectroscopy over the last forty years have allowed the measurement of surface phonon dispersion curves of more than 200 different crystal surfaces and overlayers of insulators, semiconductors and metals.

This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces.

This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed.

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.

This book gives a representative survey of the state of the art of research on gas-surface interactions. The book presents how modern surface science targets the atomic-level understanding of physical and chemical processes at surfaces, with particular emphasis on dynamical aspects.

This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references.