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Handbook of Chemical Vapor Deposition

- Principles, Technology and Applications

About Handbook of Chemical Vapor Deposition

Offers an understanding of the advances in the Chemical Vapor Deposition (CVD) process. This book features data on both Plasma CVD and metallo-organic CVD processes. It also explains growing importance of CVD in production of semiconductor and related applications.

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  • Language:
  • English
  • ISBN:
  • 9780815514329
  • Binding:
  • Hardback
  • Pages:
  • 506
  • Published:
  • August 31, 1999
  • Edition:
  • 2
  • Dimensions:
  • 164x237x40 mm.
  • Weight:
  • 944 g.
Delivery: 2-3 weeks
Expected delivery: December 14, 2024

Description of Handbook of Chemical Vapor Deposition

Offers an understanding of the advances in the Chemical Vapor Deposition (CVD) process. This book features data on both Plasma CVD and metallo-organic CVD processes. It also explains growing importance of CVD in production of semiconductor and related applications.

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