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Handbook of Chemical Vapor Deposition
- Principles, Technology and Applications
- Binding:
- Hardback
- Pages:
- 506
- Published:
- September 1, 1999
- Edition:
- 2
- Dimensions:
- 164x237x40 mm.
- Weight:
- 944 g.
Delivery:
2-3 weeks
Expected delivery: October 21, 2024
About Hugh O. (Sandia National Laboratories (retired)) Pierson
View all books by Hugh O. (Sandia National Laboratories (retired)) PiersonDescription of Handbook of Chemical Vapor Deposition
Offers an understanding of the advances in the Chemical Vapor Deposition (CVD) process. This book features data on both Plasma CVD and metallo-organic CVD processes. It also explains growing importance of CVD in production of semiconductor and related applications.
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