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Plasma Sources for Thin Film Deposition and Etching
part of the Physics of Thin Films series
- Binding:
- Hardback
- Pages:
- 328
- Published:
- September 29, 1994
- Dimensions:
- 236x158x27 mm.
- Weight:
- 642 g.
Delivery:
2-3 weeks
Expected delivery: January 10, 2025
Extended return policy to January 30, 2025
Description of Plasma Sources for Thin Film Deposition and Etching
Includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalanced magnetron sputtering, and particle formation in thin film processing plasma.
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