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Rapid Thermal Processing for Future Semiconductor Devices

About Rapid Thermal Processing for Future Semiconductor Devices

A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.

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  • Language:
  • English
  • ISBN:
  • 9780444513397
  • Binding:
  • Paperback
  • Pages:
  • 160
  • Published:
  • April 1, 2003
  • Dimensions:
  • 234x156x9 mm.
  • Weight:
  • 310 g.
Delivery: 1-2 weeks
Expected delivery: August 10, 2025

Description of Rapid Thermal Processing for Future Semiconductor Devices

A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.

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