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Simulation of Deposition Processes with PECVD Apparatus
- Binding:
- Hardback
- Pages:
- 144
- Published:
- December 31, 2011
- Dimensions:
- 162x234x14 mm.
- Weight:
- 352 g.
Delivery:
2-4 weeks
Expected delivery: July 13, 2025
Description of Simulation of Deposition Processes with PECVD Apparatus
Discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. This title presents underlying hierarchy of models for low-temperature and low-pressure plasma in order to discuss the processes that can be used to implant or deposit thin layers of important materials.
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